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Dingemans G, Terlinden NM, Verheijen MA, van de Sanden MCM, Kessels WMM.  2011.  Controlling the fixed charge and passivation properties of Si(100)/Al(2)O(3) interfaces using ultrathin SiO(2) interlayers synthesized by atomic layer deposition. Journal of Applied Physics. 110:6. Abstract
Ponomarev MV, Verheijen MA, Keuning W, van de Sanden MCM, Creatore M.  2012.  Controlling the resistivity gradient in aluminum-doped zinc oxide grown by plasma-enhanced chemical vapor deposition (vol 112, 043708, 2012). Journal of Applied Physics. 112:1.
Ponomarev MV, Verheijen MA, Keuning W, van de Sanden MCM, Creatore M.  2012.  Controlling the resistivity gradient in chemical vapor deposition-deposited aluminum-doped zinc oxide. Journal of Applied Physics. 112:7. Abstract
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Ponomarev MV, Sharma K, Verheijen MA, van de Sanden MCM, Creatore M.  2012.  Improved conductivity of aluminum-doped ZnO: The effect of hydrogen diffusion from a hydrogenated amorphous silicon capping layer. Journal of Applied Physics. 111:7. Abstract
Sharma K, Verheijen MA, van de Sanden MCM, Creatore M.  2012.  In situ crystallization kinetics studies of plasma-deposited, hydrogenated amorphous silicon layers. Journal of Applied Physics. 111:6. Abstract
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Beyene HT, Tichelaar FD, Verheijen MA, van de Sanden MCM, Creatore M.  2011.  Plasma-Assisted Deposition of Au/SiO2 Multi-layers as Surface Plasmon Resonance-Based Red-Colored Coatings. Plasmonics. 6:255-260. Abstract
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Beyene HT, Weber JW, Verheijen MA, van de Sanden MCM, Creatore M.  2012.  Real time in situ spectroscopic ellipsometry of the growth and plasmonic properties of au nanoparticles on SiO2. Nano Research. 5:513-520. Abstract
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Sharma K, Ponomarev MV, Verheijen MA, Kunz O, Tichelaar FD, van de Sanden MCM, Creatore M.  2012.  Solid-phase crystallization of ultra high growth rate amorphous silicon films. Journal of Applied Physics. 111:5. Abstract
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Dogan I, Kramer NJ, Westermann RHJ, Dohnalova K, Smets AHM, Verheijen MA, Gregorkiewicz T, van de Sanden MCM.  2013.  Ultrahigh throughput plasma processing of free standing silicon nanocrystals with lognormal size distribution. Journal of Applied Physics. 113:134306. Abstract