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2011

Chen JQ, Louis E, Wormeester H, Harmsen R, van de Kruijs R, Lee CJ, van Schaik W, Bijkerk F. 2011. Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science & Technology. 22:8. Abstract

Chen JQ, Louis E, Harmsen R, Tsarfati T, Wormeester H, van Kampen M, van Schaik W, van de Kruijs R, Bijkerk F. 2011. In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science. 258:7-12. Abstract

2009

Chen JQ, Louis E, Lee CJ, Wormeester H, Kunze R, Schmidt H, Schneider D, Moors R, van Schaik W, Lubomska M et al.. 2009. Detection and characterization of carbon contamination on EUV multilayer mirrors. Optics Express. 17:16969-16979. Abstract