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2013
Sobierajski R, Loch RA, van de Kruijs RWE, Louis E, von Blanckenhagen G, Gullikson EM, Siewert F, Wawro A, Bijkerk F.  2013.  Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources. Journal of Synchrotron Radiation. 20:249-257. Abstract
van der Meer R, Kozhevnikov I, Krishnan B, Huskens J, Hegeman P, Brons C, Vratzov B, Bastiaens B, Boller K, Bijkerk F.  2013.  Single-order operation of lamellar multilayer gratings in the soft x-ray spectral range. Aip Advances. 3:012103. Abstract
2012
Nyabero SL, van de Kruijs RWE, Yakshin AE, Zoethout E, Bijkerk F.  2012.  Thermally induced interface chemistry in Mo/B4C/Si/B4C multilayered films. Journal of Applied Physics. 112:5. Abstract
Bosgra J, Verhoeven J, van de Kruijs RWE, Yakshin AE, Bijkerk F.  2012.  Non-constant diffusion characteristics of nanoscopic Mo-Si interlayer growth. Thin Solid Films. 522:228-232. Abstract
Makhotkin IA, Zoethout E, Louis E, Yakunin AM, Mullender S, Bijkerk F.  2012.  Spectral properties of La/B - based multilayer mirrors near the boron K absorption edge. Optics Express. 20:11778-11786. Abstract
Bruijn S, van de Kruijs RWE, Yakshin AE, Bijkerk F.  2012.  Ion assisted growth of B4C diffusion barrier layers in Mo/Si multilayered structures. Journal of Applied Physics. 111:5. Abstract
Liu F, Lee CJ, Chen JQ, Louis E, van der Slot PJM, Boller KJ, Bijkerk F.  2012.  Ellipsometry with randomly varying polarization states. Optics Express. 20:870-878. Abstract
van den Boogaard AJR, van Goor FA, Louis E, Bijkerk F.  2012.  Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection. Optics Letters. 37:160-162. Abstract
Kuznetsov AS, Gleeson MA, Bijkerk F.  2012.  Hydrogen-induced blistering mechanisms in thin film coatings. Journal of Physics-Condensed Matter. 24:6. Abstract
Bayraktar M, Wessels WA, Lee CJ, van Goor FA, Koster G, Rijnders G, Bijkerk F.  2012.  Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths. Journal of Physics D-Applied Physics. 45:5. Abstract
van den Boogaard AJR, Zoethout E, Makhotkin IA, Louis E, Bijkerk F.  2012.  Influence of noble gas ion polishing species on extreme ultraviolet mirrors. Journal of Applied Physics. 112 Abstract
Loch RA, Sobierajski R, Louis E, Bosgra J, Bijkerk F.  2012.  Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources. Optics Express. 20:28200-28215. Abstract
Bosgra J, Zoethout E, van der Eerden AMJ, Verhoeven J, van de Kruijs RWE, Yakshin AE, Bijkerk F.  2012.  Structural properties of subnanometer thick Y layers in extreme ultraviolet multilayer mirrors. Applied Optics. 51:8541-8548. Abstract
Kuznetsov AS, Stuik R, Bijkerk F, Shevelko AP.  2012.  Spectral and spatial structure of extreme ultraviolet radiation in laser plasma-wall interactions. Plasma Physics and Controlled Fusion. 54:6. Abstract
Medvedev VV, Yakshin AE, van de Kruijs RWE, Krivtsun VM, Yakunin AM, Koshelev KN, Bijkerk F.  2012.  Infrared antireflective filtering for extreme ultraviolet multilayer Bragg reflectors. Optics Letters. 37:1169-1171. Abstract
Louis E.  2012.  Physics and technology development of multilayer EUV reflective optics. Universiteit Twente, faculteit Technische Natuurwetenschappen. PhD
2011
van den Boogaard AJR, Louis E, Zoethout E, Goldberg KA, Bijkerk F.  2011.  Characterization of Mo/Si multilayer growth on stepped topographies. Journal of Vacuum Science & Technology B. 29:6. Abstract
Medvedev VV, Yakshin AE, van de Kruijs RWE, Krivtsun VM, Yakunin AM, Koshelev KN, Bijkerk F.  2011.  Infrared suppression by hybrid EUV multilayer-IR etalon structures. Optics Letters. 36:3344-3346. Abstract
Loch RA, Dubrouil A, Sobierajski R, Descamps D, Fabre B, Lidon P, van de Kruijs RWE, Boekhout F, Gullikson E, Gaudin J et al..  2011.  Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements. Optics Letters. 36:3386-3388. Abstract
Chen JQ, Louis E, Wormeester H, Harmsen R, van de Kruijs R, Lee CJ, van Schaik W, Bijkerk F.  2011.  Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science & Technology. 22:8. Abstract