Output

Lijst
Filter

Export 31 results:

Sort by: Auteur [ Titel

Filters: Auteur is Louis, E. [Clear All Filters]

A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

A

Rouzee A, Johnsson P, Gryzlova EV, Fukuzawa H, Yamada A, Siu W, Huismans Y, Louis E, Bijkerk F, Holland DMP et al.. 2011. Angle-resolved photoelectron spectroscopy of sequential three-photon triple ionization of neon at 90.5 eV photon energy. Physical Review A. 83:4. Abstract

C

Chen JQ, Louis E, Wormeester H, Harmsen R, van de Kruijs R, Lee CJ, van Schaik W, Bijkerk F. 2011. Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science & Technology. 22:8. Abstract

Chen JQ, Lee CJ, Louis E, Bijkerk F, Kunze R, Schmidt H, Schneider D, Moors R. 2009. Characterization of EUV induced carbon films using laser-generated surface acoustic waves. :768-771. Abstract

van den Boogaard AJR, Louis E, Zoethout E, Goldberg KA, Bijkerk F. 2011. Characterization of Mo/Si multilayer growth on stepped topographies. Journal of Vacuum Science & Technology B. 29:6. Abstract

D

Sobierajski R, Bruijn S, Khorsand AR, Louis E, de Kruijs R, Burian T, Chalupsky J, Cihelka J, Gleeson A, Grzonka J et al.. 2011. Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources. Optics Express. 19:193-205. Abstract

Chen JQ, Louis E, Lee CJ, Wormeester H, Kunze R, Schmidt H, Schneider D, Moors R, van Schaik W, Lubomska M et al.. 2009. Detection and characterization of carbon contamination on EUV multilayer mirrors. Optics Express. 17:16969-16979. Abstract

Abdali S, Gerward L, Yakshin AE, Louis E, Bijkerk F. 2002. Determination of crystallization as a function of Mo layer thickness in Mo/Si multilayers. Materials Research Bulletin. 37:279-289.

Makhotkin IA, Louis E, van de Kruijs RWE, Yakshin AE, Zoethout E, Seregin AY, Tereschenko EY, Yakunin SN, Bijkerk F. 2011. Determination of the density of ultrathin La films in La/B(4)C layered structures using X-ray standing waves. Physica Status Solidi a-Applications and Materials Science. 208:2597-2600. Abstract

E

Liu F, Lee CJ, Chen JQ, Louis E, van der Slot PJM, Boller KJ, Bijkerk F. 2012. Ellipsometry with randomly varying polarization states. Optics Express. 20:870-878. Abstract

F

Dobrovolskiy S, Yakshin AE, Tichelaar FD, Verhoeven J, Louis E, Bijkerk F. 2010. Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms. 268:560-567. Abstract

I

Alink L, de Kruijs RWE, Louis E, Bijkerk F, Verhoeven J. 2006. Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions. Thin Solid Films. 510:26-31.

Chen JQ, Louis E, Harmsen R, Tsarfati T, Wormeester H, van Kampen M, van Schaik W, van de Kruijs R, Bijkerk F. 2011. In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science. 258:7-12. Abstract

van den Boogaard AJR, Zoethout E, Makhotkin IA, Louis E, Bijkerk F. 2012. Influence of noble gas ion polishing species on extreme ultraviolet mirrors. Journal of Applied Physics. 112 Abstract

Nedelcu I, de Kruijs R, Yakshin AE, Tichelaar F, Zoethout E, Louis E, Enkisch H, Muellender S, Bijkerk F. 2006. Interface roughness in Mo/Si multilayers. Thin Solid Films. 515:434-438.

M

Sobierajski R, Loch RA, van de Kruijs RWE, Louis E, von Blanckenhagen G, Gullikson EM, Siewert F, Wawro A, Bijkerk F. 2013. Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources. Journal of Synchrotron Radiation. 20:249-257. Abstract

Loch RA, Sobierajski R, Louis E, Bosgra J, Bijkerk F. 2012. Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources. Optics Express. 20:28200-28215. Abstract

Koster N, Mertens B, Jansen R, van de Runstraat A, Stietz F, Wedowski M, Meiling H, Klein R, Gottwald A, Scholze F et al.. 2002. Molecular contamination mitigation in EUVL by environmental control. Microelectronic Engineering. 61-2:65-76. Abstract

N

van de Kruijs RWE, Zoethout E, Yakshin AE, Nedelcu I, Louis E, Enkisch H, Sipos G, Mullender S, Bijkerk F. 2006. Nano-size crystallites in Mo/Si multilayer optics. Thin Solid Films. 515:430-433.

Louis E, Yakshin AE, Tsarfati T, Bijkerk F. 2011. Nanometer interface and materials control for multilayer EUV-optical applications. Progress in Surface Science. 86:255-294. Abstract

Tsarfati T, van de Kruijs RWE, Zoethout E, Louis E, Bijkerk F. 2010. Nitridation and contrast of B4C/La interfaces and X-ray multilayer optics. Thin Solid Films. 518:7249-7252. Abstract