Filters: Auteur is Louis, E. [Clear All Filters]
Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science & Technology. 22:8.. 2011.
Characterization of Mo/Si multilayer growth on stepped topographies. Journal of Vacuum Science & Technology B. 29:6.. 2011.
Damage mechanisms of MoN/SiN multilayer optics for next-generation pulsed XUV light sources. Optics Express. 19:193-205.. 2011.
Detection and characterization of carbon contamination on EUV multilayer mirrors. Optics Express. 17:16969-16979.. 2009.
Determination of crystallization as a function of Mo layer thickness in Mo/Si multilayers. Materials Research Bulletin. 37:279-289.. 2002.
Determination of the density of ultrathin La films in La/B(4)C layered structures using X-ray standing waves. Physica Status Solidi a-Applications and Materials Science. 208:2597-2600.. 2011.
Ellipsometry with randomly varying polarization states. Optics Express. 20:870-878.. 2012.
Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms. 268:560-567.. 2010.
In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science. 258:7-12.. 2011.
Influence of noble gas ion polishing species on extreme ultraviolet mirrors. Journal of Applied Physics. 112. 2012.
Interface roughness in Mo/Si multilayers. Thin Solid Films. 515:434-438.. 2006.
Mo/Si multilayer-coated amplitude-division beam splitters for XUV radiation sources. Journal of Synchrotron Radiation. 20:249-257.. 2013.
Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources. Optics Express. 20:28200-28215.. 2012.
Molecular contamination mitigation in EUVL by environmental control. Microelectronic Engineering. 61-2:65-76.. 2002.
Nano-size crystallites in Mo/Si multilayer optics. Thin Solid Films. 515:430-433.. 2006.
Nanometer interface and materials control for multilayer EUV-optical applications. Progress in Surface Science. 86:255-294.. 2011.
Nitridation and contrast of B4C/La interfaces and X-ray multilayer optics. Thin Solid Films. 518:7249-7252.. 2010.