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A
Abdali S, Gerward L, Yakshin AE, Louis E, Bijkerk F.  2002.  Determination of crystallization as a function of Mo layer thickness in Mo/Si multilayers. Materials Research Bulletin. 37:279-289.
Alink L, de Kruijs RWE, Louis E, Bijkerk F, Verhoeven J.  2006.  Improved temperature stability of Mo/Si multilayers by carbide based diffusion barriers through implantation of low energy CHx+ ions. Thin Solid Films. 510:26-31.
B
van den Boogaard AJR, Zoethout E, Makhotkin IA, Louis E, Bijkerk F.  2012.  Influence of noble gas ion polishing species on extreme ultraviolet mirrors. Journal of Applied Physics. 112 Abstract
van den Boogaard AJR, van Goor FA, Louis E, Bijkerk F.  2012.  Wavelength separation from extreme ultraviolet mirrors using phaseshift reflection. Optics Letters. 37:160-162. Abstract
van den Boogaard AJR, Louis E, Zoethout E, Goldberg KA, Bijkerk F.  2011.  Characterization of Mo/Si multilayer growth on stepped topographies. Journal of Vacuum Science & Technology B. 29:6. Abstract
van den Boogaard AJR, Louis E, Zoethout E, Mullender S, Bijkerk F.  2010.  Surface morphology of Kr+-polished amorphous Si layers. Journal of Vacuum Science & Technology A. 28:552-558. Abstract
C
Chen JQ, Louis E, Harmsen R, Tsarfati T, Wormeester H, van Kampen M, van Schaik W, van de Kruijs R, Bijkerk F.  2011.  In situ ellipsometry study of atomic hydrogen etching of extreme ultraviolet induced carbon layers. Applied Surface Science. 258:7-12. Abstract
Chen JQ, Louis E, Lee CJ, Wormeester H, Kunze R, Schmidt H, Schneider D, Moors R, van Schaik W, Lubomska M et al..  2009.  Detection and characterization of carbon contamination on EUV multilayer mirrors. Optics Express. 17:16969-16979. Abstract
Chen JQ, Louis E, Verhoeven J, Harmsen R, Lee CJ, Lubomska M, van Kampen M, van Schaik W, Bijkerk F.  2010.  Secondary electron yield measurements of carbon covered multilayer optics. Applied Surface Science. 257:354-361. Abstract
Chen JQ, Lee CJ, Louis E, Bijkerk F, Kunze R, Schmidt H, Schneider D, Moors R.  2009.  Characterization of EUV induced carbon films using laser-generated surface acoustic waves. :768-771. Abstract
Chen JQ, Louis E, Wormeester H, Harmsen R, van de Kruijs R, Lee CJ, van Schaik W, Bijkerk F.  2011.  Carbon-induced extreme ultraviolet reflectance loss characterized using visible-light ellipsometry. Measurement Science & Technology. 22:8. Abstract
D
Dobrovolskiy S, Yakshin AE, Tichelaar FD, Verhoeven J, Louis E, Bijkerk F.  2010.  Formation of Si/SiC multilayers by low-energy ion implantation and thermal annealing. Nuclear Instruments & Methods in Physics Research Section B-Beam Interactions with Materials and Atoms. 268:560-567. Abstract
H
van Herpen M, de Kruijs R, Klunder DJW, Louis E, Yakshin AE, van der Westen SA, Bijkerk F, Banine V.  2008.  Spectral-purity-enhancing layer for multilayer mirrors. Optics Letters. 33:560-562. Abstract
K
Khorsand AR, Sobierajski R, Louis E, Bruijn S, van Hattum ED, van de Kruijs RWE, Jurek M, Klinger D, Pelka JB, Juha L et al..  2010.  Single shot damage mechanism of Mo/Si multilayer optics under intense pulsed XUV-exposure. Optics Express. 18:700-712. Abstract
Koster N, Mertens B, Jansen R, van de Runstraat A, Stietz F, Wedowski M, Meiling H, Klein R, Gottwald A, Scholze F et al..  2002.  Molecular contamination mitigation in EUVL by environmental control. Microelectronic Engineering. 61-2:65-76. Abstract
van de Kruijs RWE, Zoethout E, Yakshin AE, Nedelcu I, Louis E, Enkisch H, Sipos G, Mullender S, Bijkerk F.  2006.  Nano-size crystallites in Mo/Si multilayer optics. Thin Solid Films. 515:430-433.
L
Liu F, Lee CJ, Chen JQ, Louis E, van der Slot PJM, Boller KJ, Bijkerk F.  2012.  Ellipsometry with randomly varying polarization states. Optics Express. 20:870-878. Abstract
Loch RA, Sobierajski R, Louis E, Bosgra J, Bijkerk F.  2012.  Modelling single shot damage thresholds of multilayer optics for high-intensity short-wavelength radiation sources. Optics Express. 20:28200-28215. Abstract
Loch RA, Dubrouil A, Sobierajski R, Descamps D, Fabre B, Lidon P, van de Kruijs RWE, Boekhout F, Gullikson E, Gaudin J et al..  2011.  Phase characterization of the reflection on an extreme UV multilayer: comparison between attosecond metrology and standing wave measurements. Optics Letters. 36:3386-3388. Abstract
Louis E.  2012.  Physics and technology development of multilayer EUV reflective optics. Universiteit Twente, faculteit Technische Natuurwetenschappen. PhD