Atomic layer deposition for nanostructured Li-ion batteries

TitelAtomic layer deposition for nanostructured Li-ion batteries
Publication TypeJournal Article
Year of Publication2012
AuthorsKnoops HCM, Donders ME, van de Sanden MCM, Notten PHL, Kessels WMM
JournalJournal of Vacuum Science & Technology A
Volume30
Pagination10
Date PublishedJan
Type of ArticleReview
ISBN Number0734-2101
Accession NumberWOS:000298992800065
TrefwoordenANODE MATERIALS, CHALLENGES, CONVERSION, ELECTRODE MATERIALS, INTERCALATION, LITHIUM BATTERIES, REMOTE PLASMA ALD, SURFACE-CHEMISTRY, THIN-FILM, TIN
AbstractNanostructuring is targeted as a solution to achieve the improvements required for implementing Li-ion batteries in a wide range of applications. These applications range in size from electrical vehicles down to microsystems. Atomic layer deposition (ALD) could be an enabling technology for nanostructured Li-ion batteries as it is capable of depositing ultrathin films (1-100 nm) in complex structures with precise growth control. The potential of ALD is reviewed for three battery concepts that can be distinguished, i.e., particle-based electrodes, 3D-structured electrodes, and 3D all-solid-state microbatteries. It is discussed that a large range of materials can be deposited by ALD and recent demonstrations of battery improvements by ALD are used to exemplify its large potential. (C) 2012 American Vacuum Society. [DOI: 10.1116/1.3660699]
URLhttp://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=Test&SrcApp=TestApp&DestLinkType=FullRecord&KeyUT=WOS:000298992800065&DestApp=WOS
Alternate JournalJ. Vac. Sci. Technol. A