| Titel | In-situ study of the diffusion-reaction mechanism in Mo/Si multilayered films |
| Publication Type | Journal Article |
| Year of Publication | 2011 |
| Authors | Bruijn S, van de Kruijs RWE, Yakshin AE, Bijkerk F |
| Journal | Applied Surface Science |
| Volume | 257 |
| Pagination | 2707-2711 |
| Date Published | Jan |
| Type of Article | Article |
| ISBN Number | 0169-4332 |
| Accession Number | ISI:000285963200050 |
| Trefwoorden | DIFFRACTION, diffusion, INTERDIFFUSION, INTERFACE, molybdenum, MoSi2, multilayers, OPTICS, RATES, silicon, STRUCTURAL RELAXATION, thin films, TRANSITION, X-RAY, X-RAY-DIFFRACTION |
| Abstract | We present a low temperature diffusion study on the formation of intermixing zones between periodic, nanometer thick films consisting of Mo and Si. An in-situ X-ray diffraction method at pm-accuracy was developed, including a model that explains the period change observed by diffusion limited interface growth. Experiments were carried out on Mo/Si multilayered films in the temperature range of 100-275 degrees C, resulting in the determination of diffusion coefficients. Temperature scaling showed Arrhenius-type behavior of the diffusion constant over the entire temperature range, with an activation energy of 0.5 eV. (C) 2010 Elsevier B.V. All rights reserved. |
| URL | http://gateway.isiknowledge.com/gateway/Gateway.cgi?&GWVersion=2&SrcAuth=Test&SrcApp=TestApp&DestLinkType=FullRecord&KeyUT=000285963200050&DestApp=WOS |
| Alternate Journal | Appl. Surf. Sci. |
